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Research Highlights Reappearance of the 6-root3 surface after 1-nm Si deposition on the surface of P/Si(111)-6-root-3 surface at 510 K followed by annealing at 900 K for 3 min. Scale bar=50 nm. Inset: close-up image of the surface. [Surf. Sci. x, xxx (2007)]
Reappearance of the 6-root3 surface after 1-nm Si deposition on the surface of P/Si(111)-6-root-3 surface at 510 K followed by annealing at 900 K for 3 min. Scale bar=50 nm. Inset: close-up image of the surface. [Surf. Sci. x, xxx (2007)]
Reappearance of the 6-root3 surface after 1-nm Si deposition on the surface of P/Si(111)-6-root-3 surface at 510 K followed by annealing at 900 K for 3 min. Scale bar=50 nm. Inset: close-up image of the surface.
[Surf. Sci. x, xxx (2007)]
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